Annealing of induced absorption in quartz glasses by ArF laser radiation
Abstract
Annealing of individual bands of electron-beam-induced absorption (IA) in the region of 150 - 400 nm in KS-4V, KU-1, and Corning 7980 (ArF Grade) quartz glasses by ArF laser radiation is studied. It is shown that the phototransformation of the IA spectra occurs mainly due to a significant decrease in the amplitudes of bands at {lambda} = 183.5, 213, and 260 nm. The role played by interstitial oxygen, hydrogen, and chlorine in the formation and relaxation of glass defects is considered. (effects of laser radiation on matter. laser plasma)
- Authors:
-
- P N Lebedev Physical Institute, Russian Academy of Sciences, Moscow (Russian Federation)
- Publication Date:
- OSTI Identifier:
- 21471145
- Resource Type:
- Journal Article
- Journal Name:
- Quantum Electronics (Woodbury, N.Y.)
- Additional Journal Information:
- Journal Volume: 40; Journal Issue: 9; Other Information: DOI: 10.1070/QE2010v040n09ABEH014309; Journal ID: ISSN 1063-7818
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ABSORPTION; AMPLITUDES; ANNEALING; ARGON FLUORIDES; CHLORINE; ELECTRON BEAMS; GLASS; HYDROGEN; INTERSTITIALS; LASER RADIATION; OXYGEN; QUARTZ; SPECTRA; ARGON COMPOUNDS; BEAMS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUORIDES; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; HALOGENS; HEAT TREATMENTS; LEPTON BEAMS; MINERALS; NONMETALS; OXIDE MINERALS; PARTICLE BEAMS; POINT DEFECTS; RADIATIONS; RARE GAS COMPOUNDS; SORPTION
Citation Formats
Sergeev, P B, and Sergeev, A P. Annealing of induced absorption in quartz glasses by ArF laser radiation. United States: N. p., 2010.
Web. doi:10.1070/QE2010V040N09ABEH014309.
Sergeev, P B, & Sergeev, A P. Annealing of induced absorption in quartz glasses by ArF laser radiation. United States. https://doi.org/10.1070/QE2010V040N09ABEH014309
Sergeev, P B, and Sergeev, A P. 2010.
"Annealing of induced absorption in quartz glasses by ArF laser radiation". United States. https://doi.org/10.1070/QE2010V040N09ABEH014309.
@article{osti_21471145,
title = {Annealing of induced absorption in quartz glasses by ArF laser radiation},
author = {Sergeev, P B and Sergeev, A P},
abstractNote = {Annealing of individual bands of electron-beam-induced absorption (IA) in the region of 150 - 400 nm in KS-4V, KU-1, and Corning 7980 (ArF Grade) quartz glasses by ArF laser radiation is studied. It is shown that the phototransformation of the IA spectra occurs mainly due to a significant decrease in the amplitudes of bands at {lambda} = 183.5, 213, and 260 nm. The role played by interstitial oxygen, hydrogen, and chlorine in the formation and relaxation of glass defects is considered. (effects of laser radiation on matter. laser plasma)},
doi = {10.1070/QE2010V040N09ABEH014309},
url = {https://www.osti.gov/biblio/21471145},
journal = {Quantum Electronics (Woodbury, N.Y.)},
issn = {1063-7818},
number = 9,
volume = 40,
place = {United States},
year = {Sat Nov 13 00:00:00 EST 2010},
month = {Sat Nov 13 00:00:00 EST 2010}
}
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