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Title: Topological insulator Bi{sub 2}Se{sub 3} thin films grown on double-layer graphene by molecular beam epitaxy

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3494595· OSTI ID:21467005
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  1. Institute of Physics, Chinese Academy of Sciences, Beijing 100190 (China)
  2. Department of Physics, Tsinghua University, Beijing 100084 (China)
  3. Department of Physics, Stanford University, Stanford, California 94305-4045 (United States)

Atomically flat thin films of topological insulator Bi{sub 2}Se{sub 3} have been grown on double-layer graphene formed on 6H-SiC(0001) substrate by molecular beam epitaxy. By a combined study of reflection high energy electron diffraction and scanning tunneling microscopy, we identified the Se-rich condition and temperature criterion for layer-by-layer growth of epitaxial Bi{sub 2}Se{sub 3} films. The as-grown films without doping exhibit a low defect density of 1.0{+-}0.2x10{sup 11}/cm{sup 2}, and become a bulk insulator at a thickness of ten quintuple layers, as revealed by in situ angle resolved photoemission spectroscopy measurement.

OSTI ID:
21467005
Journal Information:
Applied Physics Letters, Vol. 97, Issue 14; Other Information: DOI: 10.1063/1.3494595; (c) 2010 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English