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Title: Congruent evaporation temperature of GaAs(001) controlled by As flux

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3491552· OSTI ID:21466928
; ; ;  [1];  [2]
  1. School of Physics, Monash University, Victoria 3800 (Australia)
  2. IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, New York 10598 (United States)

The congruent evaporation temperature T{sub c} is a fundamental surface characteristic of GaAs and similar compounds. Above T{sub c} the rate of As evaporation exceeds that of Ga during Langmuir (free) evaporation into a vacuum. However, during molecular beam epitaxy (MBE) there is generally an external As flux F incident on the surface. Here we show that this flux directly controls T{sub c}. We introduce a sensitive approach to measure T{sub c} based on Ga droplet stability, and determine the dependence of T{sub c} on F. This dependence is explained by a simple model for evaporation in the presence of external flux. The capability of manipulating T{sub c} via changing F offers a means of controlling congruent evaporation with relevance to MBE, surface preparation methods, and droplet epitaxy.

OSTI ID:
21466928
Journal Information:
Applied Physics Letters, Vol. 97, Issue 12; Other Information: DOI: 10.1063/1.3491552; (c) 2010 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English