Tilt angle control of nanocolumns grown by glancing angle sputtering at variable argon pressures

Journal Article · Mon Oct 25 00:00:00 EDT 2010 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3506502· OSTI ID:21464538

Garcia-Martin, J M; Cebollada, A ^[1]; Alvarez, R; Romero-Gomez, P; Palmero, A ^[2]

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1. IMM-Instituto de Microelectronica de Madrid (CNM-CSIC), Isaac Newton 8, 28760 Tres Cantos, Madrid (Spain)
2. Instituto de Ciencia de Materiales de Sevilla, (CSIC-Universidad de Sevilla), Americo Vespucio 49, 41092 Seville (Spain)

We show that the tilt angle of nanostructures obtained by glancing angle sputtering is finely tuned by selecting the adequate argon pressure. At low pressures, a ballistic deposition regime dominates, yielding high directional atoms that form tilted nanocolumns. High pressures lead to a diffusive regime which gives rise to vertical columnar growth. Monte Carlo simulations reproduce the experimental results indicating that the loss of directionality of the sputtered particles in the gas phase, together with the self-shadowing mechanism at the surface, are the main processes responsible for the development of the columns.

• OSTI ID: 21464538
• Journal Information: Applied Physics Letters, Vol. 97, Issue 17; Other Information: DOI: 10.1063/1.3506502; (c) 2010 American Institute of Physics; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

77 NANOSCIENCE AND NANOTECHNOLOGY
36 MATERIALS SCIENCE
ARGON
ATOMS
COMPUTERIZED SIMULATION
CRYSTAL GROWTH
DEPOSITION
FABRICATION
GOLD
MONTE CARLO METHOD
NANOSTRUCTURES
PARTICLES
PRESSURE DEPENDENCE
SPUTTERING
CALCULATION METHODS
ELEMENTS
FLUIDS
GASES
METALS
NONMETALS
RARE GASES
SIMULATION
TRANSITION ELEMENTS