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Title: Interaction of vacuum ultraviolet light with a low-k organosilicate glass film in the presence of NH{sub 3}

Abstract

In situ x-ray photoemission spectroscopy (XPS) and ex situ Fourier transform infrared spectroscopy (FTIR) were used to characterize effects on organosilicate films of 147 nm irradiation in the presence of 10{sup -4} Torr NH{sub 3}. XPS and FTIR data indicate Si-O and Si-C bond scission, with nitridation only at Si sites. Photoirradiation causes the surface layer to become enriched in sp{sup 2} carbon. FTIR spectra of silanol formation upon exposure to ambient indicate reactive sites in the bulk have lifetimes of up to six days. XPS data indicate lifetimes of approxminutes for surface states. Nitrogen uptake passivates with longer exposure times, indicating surface densification.

Authors:
 [1]; ;  [2]; ; ; ; ;  [3]
  1. Department of Physics, University of North Texas, Denton, Texas 76203 (United States)
  2. Department of Chemical Engineering, University of California-Berkeley, Berkeley, California 94549 (United States)
  3. Department of Chemistry, University of North Texas, Denton, Texas 76203 (United States)
Publication Date:
OSTI Identifier:
21367019
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 97; Journal Issue: 3; Other Information: DOI: 10.1063/1.3466905; (c) 2010 American Institute of Physics; Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; AMMONIA; CARBON; ELECTRONIC STRUCTURE; FILMS; FOURIER TRANSFORM SPECTROMETERS; FOURIER TRANSFORMATION; GLASS; INFRARED SPECTRA; NITRIDATION; NITROGEN; PASSIVATION; PHOTOEMISSION; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTRA; X-RAY PHOTOELECTRON SPECTROSCOPY; X-RAY SPECTRA; CHEMICAL REACTIONS; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ELEMENTS; EMISSION; HYDRIDES; HYDROGEN COMPOUNDS; INTEGRAL TRANSFORMATIONS; MEASURING INSTRUMENTS; NITROGEN COMPOUNDS; NITROGEN HYDRIDES; NONMETALS; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; SECONDARY EMISSION; SPECTRA; SPECTROMETERS; SPECTROSCOPY; TRANSFORMATIONS

Citation Formats

Behera, Swayambhu, Lee, Joe, Graves, David, Gaddam, Sneha, Pokharel, Sundari, Wilks, Justin, Pasquale, Frank, and Kelber, Jeffry A. Interaction of vacuum ultraviolet light with a low-k organosilicate glass film in the presence of NH{sub 3}. United States: N. p., 2010. Web. doi:10.1063/1.3466905.
Behera, Swayambhu, Lee, Joe, Graves, David, Gaddam, Sneha, Pokharel, Sundari, Wilks, Justin, Pasquale, Frank, & Kelber, Jeffry A. Interaction of vacuum ultraviolet light with a low-k organosilicate glass film in the presence of NH{sub 3}. United States. https://doi.org/10.1063/1.3466905
Behera, Swayambhu, Lee, Joe, Graves, David, Gaddam, Sneha, Pokharel, Sundari, Wilks, Justin, Pasquale, Frank, and Kelber, Jeffry A. 2010. "Interaction of vacuum ultraviolet light with a low-k organosilicate glass film in the presence of NH{sub 3}". United States. https://doi.org/10.1063/1.3466905.
@article{osti_21367019,
title = {Interaction of vacuum ultraviolet light with a low-k organosilicate glass film in the presence of NH{sub 3}},
author = {Behera, Swayambhu and Lee, Joe and Graves, David and Gaddam, Sneha and Pokharel, Sundari and Wilks, Justin and Pasquale, Frank and Kelber, Jeffry A},
abstractNote = {In situ x-ray photoemission spectroscopy (XPS) and ex situ Fourier transform infrared spectroscopy (FTIR) were used to characterize effects on organosilicate films of 147 nm irradiation in the presence of 10{sup -4} Torr NH{sub 3}. XPS and FTIR data indicate Si-O and Si-C bond scission, with nitridation only at Si sites. Photoirradiation causes the surface layer to become enriched in sp{sup 2} carbon. FTIR spectra of silanol formation upon exposure to ambient indicate reactive sites in the bulk have lifetimes of up to six days. XPS data indicate lifetimes of approxminutes for surface states. Nitrogen uptake passivates with longer exposure times, indicating surface densification.},
doi = {10.1063/1.3466905},
url = {https://www.osti.gov/biblio/21367019}, journal = {Applied Physics Letters},
issn = {0003-6951},
number = 3,
volume = 97,
place = {United States},
year = {Mon Jul 19 00:00:00 EDT 2010},
month = {Mon Jul 19 00:00:00 EDT 2010}
}