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Title: Dielectric barrier discharge plasma treatment on E. coli: Influence of CH{sub 4}/N{sub 2}, O{sub 2}, N{sub 2}/O{sub 2}, N{sub 2}, and Ar gases

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3236570· OSTI ID:21361895
;  [1]; ;  [2]
  1. Institute for Physics, Ernst-Moritz-Arndt-University Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald (Germany)
  2. Institute for Biochemistry, Ernst-Moritz-Arndt-University Greifswald, Felix-Hausdorff-Str. 4, 17489 Greifswald (Germany)

Atmospheric pressure dielectric barrier discharge (DBD) plasma has been employed on Gram-negative bacteria, Escherichia coli BL21. Treatment was carried out using plasma generated with different compositions of gases: CH{sub 4}/N{sub 2} (1:2), O{sub 2}, N{sub 2}/O{sub 2} (1:1), N{sub 2}, and Ar, and by varying plasma power and treatment time. E. coli cells were exposed under the DBD plasma in triplicates, and their surviving numbers were observed in terms of colony forming units. It has been observed that the CH{sub 4}/N{sub 2} plasma exhibits relatively higher sterilization property toward E. coli compared to plasma generated by using O{sub 2}, N{sub 2}/O{sub 2}, N{sub 2}, and Ar gas mixtures. The time to kill up to 90% of the initial population of the E. coli cells was found to be about 2-3 min for CH{sub 4}/N{sub 2} and O{sub 2} gas mixture DBD plasma. A prolongation of treatment time and an increase in the dissipated power significantly improved the E. coli killing efficiency of the atmospheric pressure DBD plasma.

OSTI ID:
21361895
Journal Information:
Journal of Applied Physics, Vol. 106, Issue 8; Other Information: DOI: 10.1063/1.3236570; (c) 2009 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English