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Title: Microstructure and tribological properties of Ti-contained amorphous carbon film deposited by DC magnetron sputtering

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3272018· OSTI ID:21359395
; ; ;  [1]; ;  [2]
  1. Department of Materials Science and Engineering and State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027 (China)
  2. Zhejiang Huijin-Teer Coatings Technology Co., Ltd., Hangzhou 311300 (China)

Pure amorphous carbon (a-C) film and that with a small amount of Ti were deposited on high speed steel (W18Cr4V) substrates by means of dc closed field unbalanced magnetron sputtering. The chemical composition and microstructure of the a-C films were performed using x-ray photoelectron spectroscopy, x-ray diffraction, Raman spectra, and transmission electron microscopy. The mechanical and tribological properties were evaluated using a nanoindentor, Rockwell and scratch tests, and a conventional ball-on-disk tribometer, respectively. The pure a-C film showed the high hardness (53 GPa), elastic modulus (289 GPa), but the poor adhesive strength. When adding a small amount of Ti to the a-C film, both the adhesive strength and the tribological properties were improved. The Ti contained a-C film had the low wear rate (1.9x10{sup -17} m{sup 3} N{sup -1} m{sup -1}) and friction coefficient in humid air.

OSTI ID:
21359395
Journal Information:
Journal of Applied Physics, Vol. 106, Issue 12; Other Information: DOI: 10.1063/1.3272018; (c) 2009 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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