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Title: Unambiguous determination of carrier concentration and mobility for InAs/GaSb superlattice photodiode optimization

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3191175· OSTI ID:21359357
; ; ; ; ;  [1]; ;  [2]
  1. Institut d'Electronique du Sud (IES), UMR CNRS 5214, Case 067, Universite Montpellier 2, 34095 Montpellier Cedex 05 (France)
  2. Groupe d'Etude des Semiconducteurs (GES), UMR CNRS 5650, Case 074, Universite Montpellier 2, 34095 Montpellier Cedex 5 (France)

In this communication we report on electrical properties of nonintentionally doped (nid) type II InAs/GaSb superlattice grown by molecular beam epitaxy. We present a simple technological process which, thanks to the suppression of substrate, allows direct Hall measurement on superlattice structures grown on conductive GaSb substrate. Two samples were used to characterize the transport: one grown on a semi-insulating GaAs substrate and another grown on n-GaSb substrate where a etch stop layer was inserted to remove the conductive substrate. Mobilities and carrier concentrations have been measured as a function of temperature (77-300 K), and compared with capacitance-voltage characteristic at 80 K of a photodiode comprising a similar nid superlattice.

OSTI ID:
21359357
Journal Information:
Journal of Applied Physics, Vol. 106, Issue 3; Other Information: DOI: 10.1063/1.3191175; (c) 2009 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English