Double plasma system with inductively coupled source plasma and quasi-quiescent target plasma
- ITA-CTA, Sao Jose dos Campos (Brazil)
Cold plasmas have successfully been used in the plasma-assisted material processing industry. An understanding of the physicochemical mechanisms involved in the plasma-surface interaction is needed for a proper description of deposition and etching processes at material surfaces. Since these mechanisms are dependent on the plasma properties, the development of diagnostic techniques is strongly desirable for determination of the plasma parameters as well as the characterization of the electromagnetic behaviour of the discharge. In this work a dual discharge chamber, was specially designed to study the deposition of thin films via plasma polymerization process. In the Pyrex chamber an inductively coupled plasma can be excited either in the diffuse low density E-mode or in the high density H-mode. This plasma diffuses into the cylindrical stainless steel chamber which is covered with permanent magnets to produce a multidipole magnetic field configuration at the surface. By that means a double plasma is established consisting of a RF source plasma coupled to a quasi-quiescent target plasma. The preliminary results presented here refer to measurements of the profiles of plasma parameters along the central axis of the double plasma apparatus. Additionally a spectrum analysis performed by means of a Rogowski coil probe immersed into the source plasma is also presented. The discharge is made in argon with pressure varying from 10{sup -2} to 1 torr, and the rf from 10 to 150 W.
- OSTI ID:
- 212992
- Report Number(s):
- CONF-950749-; TRN: 96:010141
- Resource Relation:
- Conference: 22. international conference on phenomena in ionized gases, Hoboken, NJ (United States), 31 Jul - 4 Aug 1995; Other Information: PBD: 1995; Related Information: Is Part Of XXII International conference on phenomena in ionized gases. Contributed papers 4; Becker, K.H.; Carr, W.E.; Kunhardt, E.E. [eds.]; PB: 256 p.
- Country of Publication:
- United States
- Language:
- English
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