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Title: Analysis of forward current-voltage characteristics of nonideal Ti/4H-SiC Schottky barriers

Journal Article · · Semiconductors
;  [1]
  1. Russian Academy of Sciences, Ioffe Physicotechnical Institute (Russian Federation)

Forward current-voltage characteristics of nonideal Ti/4H-SiC Schottky contacts with an ideality factor n = 1.1-1.2 in the exponential portion of the characteristics have been analyzed. The nonideality was considered to be a result of the formation of a thin dielectric layer between the deposited titanium layer and 4H-SiC. The following electrical parameters of the contacts were determined from experimental current-voltage characteristics: energy barrier height, thickness of the intermediate dielectric layer, and energy distribution of the density of states at the insulator-semiconductor interface.

OSTI ID:
21260426
Journal Information:
Semiconductors, Vol. 43, Issue 2; Other Information: DOI: 10.1134/S1063782609020122; Copyright (c) 2009 Pleiades Publishing, Ltd; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
Country of Publication:
United States
Language:
English

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