Non-Uniform Dose Mapping Controlled by Modulated Vertical and Horizontal Scans
- SEN Corporation, an SHI and Axcelis Company, 1501, Imazaike, Saijo, Ehime, 799-1362 (Japan)
Since geometries of semi-conductor devices continue to shrink, the requirement for each process becomes severer to keep uniformity of electrical parameters of the semi-conductor devices. A larger wafer also causes larger variations. Thus it has been strongly required for ion implantation process to compensate for the variations from other processes because of its good dose controllability. A newly developed mapping of intentional non-uniform dosage system, which is named 'MIND system', is implemented in SEN's single-wafer-type implanters. The MIND system controls both horizontal and vertical scan speed simultaneously. Intentional two-dimensional non-uniform profiles of sheet resistance, such as concentric and eccentric profiles, are obtained only by single-step ion implantation.
- OSTI ID:
- 21251652
- Journal Information:
- AIP Conference Proceedings, Vol. 1066, Issue 1; Conference: 17. international conference on ion implantation technology, Monterey, CA (United States), 8-13 Jun 2008; Other Information: DOI: 10.1063/1.3033582; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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