Effects Of Pressure And Power On The Ionic Saturation Current And Self-Bias Voltage In A RF Discharge 13.56 MHz Of (SF{sub 6}, O{sub 2}) At Low Pressure

Journal Article · Tue Sep 23 00:00:00 EDT 2008 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.2999939· OSTI ID:21251396

Alim, M M; Zekara, M; Henni, L; Tadjine, R; Lahmar, E; Henda, K ^[1]

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1. Centre de Developpement des Technologies Avancees Division, Milieux Ionises and Laser, Equipe, Plasmas de Decharges Cite du 20 aout 1956 B. P. 17 Baba Hassen, 16303 Alger-Algerie (Algeria)

In the present work, we are interested in RF plasma discharge for surface texturing in solar cells application. We then present the results of the electrical characterization of plasma reactor at low pressure (<1 Torr) in (SF{sub 6},O{sub 2}) gases mixtures at 13.56 MHz. We've particularly followed the self-bias voltage (V{sub DC}) and the density of ionic current saturation (J{sub s}) depending in various parameters of the discharge as pressure and power.

• OSTI ID: 21251396
• Journal Information: AIP Conference Proceedings, Vol. 1047, Issue 1; Conference: LAPAMS'08: 1. international conference on laser plasma applications in materials science, Algiers (Algeria), 23-26 Jun 2008; Other Information: DOI: 10.1063/1.2999939; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ELECTRIC CURRENTS
ELECTRIC POTENTIAL
HIGH-FREQUENCY DISCHARGES
IONIC CONDUCTIVITY
MHZ RANGE
PLASMA
PRESSURE DEPENDENCE
SOLAR CELLS
SULFUR FLUORIDES
SURFACES
TEXTURE