Surface smoothing of CVD-diamond membrane for X-ray lithography by Gas Cluster Ion Beam
- Central Research Institute, Mitsubishi Materials Corp., Omiya, Japan 330-8508 (Japan)
- Ion Beam Engineering Experimental Lab., Kyoto Univ., Kyoto, Japan 606-8501 (Japan)
Results of the surface smoothing of a CVD-diamond membrane by gas cluster ion beams are presented. An as-deposited diamond membrane with a surface roughness of 400 Aa Ra was irradiated by Ar cluster ions with a energy of 20 keV. A very smooth surface of 30 Aa Ra was obtained at a dose of 3x10{sup 17} ions/cm{sup 2}. This result can be clarified by computer simulation which shows that the surface smoothing of the diamond membrane was improved by a lateral sputtering of the cluster ions. However, a thin graphite layer was formed on the surface by contamination of monomer ions in the cluster beam, which decreased the transparency of the diamond membrane. A subsequent irradiation with O{sub 2} cluster ions removed these graphite layers.
- OSTI ID:
- 21207975
- Journal Information:
- AIP Conference Proceedings, Vol. 475, Issue 1; Conference: 15. international conference on the application of accelerators in research and industry, Denton, TX (United States), 4-7 Nov 1998; Other Information: DOI: 10.1063/1.59168; (c) 1999 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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