Spatial uniformity in chamber-cleaning plasmas measured using planar laser-induced fluorescence
- Process Measurements Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States)
Planar laser-induced fluorescence (PLIF) measurements were made to determine 2-D spatial maps of CF{sub 2} density as an indicator of chemical uniformity in 92%CF{sub 4}/O{sub 2} and 50%C{sub 2}F{sub 6}/O{sub 2} chamber-cleaning plasmas. Measurements were also made of broadband optical emission and of discharge current and voltage. All measurements were made in the Gaseous Electronics Conference (GEC) reference cell, a capacitively-coupled, parallel-plate platform designed to facilitate comparison of results among laboratories. The PLIF and emission results were found to correlate with discharge current and voltage measurements. Together, these optical and electrical measurements provide insight into the optimization of chamber-cleaning processes and reactors and suggest new methods of monitoring plasma uniformity.
- OSTI ID:
- 21202314
- Journal Information:
- AIP Conference Proceedings, Vol. 449, Issue 1; Conference: 1998 international conference on characterization and metrology for ULSI technology, Gaithersburg, MD (United States), 23-27 Mar 1998; Other Information: DOI: 10.1063/1.56831; (c) 1998 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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