Fabrication of ZnO thin films by the photochemical deposition method
- Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Gokiso, Showa, Nagoya 466-8555 (Japan)
ZnO thin films were fabricated by the photochemical deposition (PCD) method. The deposition solution contains ZnSO{sub 4}, Na{sub 2}SO{sub 3}, Na{sub 2}S{sub 2}O{sub 3} and a small amount of NH{sub 4}OH for pH adjustment. We blew oxygen or oxygen + ozone (O{sub 3}) gas into the solution to increase the dissolved oxygen content and enhance the oxidation reaction. The films were characterized by Auger electron and optical spectroscopy, and a photoelectrochemical (PEC) measurement. On an indium-tin-oxide (ITO) substrate, the films showed high optical transmission in the visible range. In a current-voltage measurement for films on a p-Si substrate, the O{sub 3} bubbling sample showed rectification properties and photovoltaic effects.
- OSTI ID:
- 21195041
- Journal Information:
- Materials Research Bulletin, Vol. 43, Issue 12; Other Information: DOI: 10.1016/j.materresbull.2008.01.014; PII: S0025-5408(08)00026-3; Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
- Country of Publication:
- United States
- Language:
- English
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