Planar patterned media fabricated by ion irradiation into CrPt{sub 3} ordered alloy films
- Department of Quantum Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603 (Japan)
- Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603 (Japan)
- Advanced Technology Department, Yamagata Fujitsu Ltd., 5400-2, Higashine-Ko, Higashine, Yamagata 999-3701 (Japan)
- Storage Technologies Laboratory, Fujitsu Laboratories Ltd., 64, Nishiwaki, Akashi, Hyogo 674-8555 (Japan)
Planar patterned media using CrPt{sub 3} ordered alloy films were fabricated by Ar{sup +} or Kr{sup +} ion irradiation through nanoimprinted or electron beam lithography made masks. CrPt{sub 3} ordered alloy film on fused quartz substrate exhibits a large perpendicular anisotropy of 5x10{sup 6} erg/cc and a large coercivity of 12 kOe, and we found that its magnetic order (magnetization) was completely suppressed by a quite low Ar{sup +} or Kr{sup +} ion dose of about 1-2x10{sup 14} ions/cm{sup 2}. Magnetic force microscope image of the ion-beam patterned CrPt{sub 3} with a bit size of 90x90 nm showed clear magnetic contrast in nonirradiated regions, while no magnetic contrast in irradiated regions. The read-back waveform taken from an ion-beam patterned CrPt{sub 3} disk with 600 nm patterning pitch showed sharp signal transition between irradiated and nonirradiated regions, which indicates the possibility of high-density planar patterned media using CrPt{sub 3} ordered alloy.
- OSTI ID:
- 21190155
- Journal Information:
- Journal of Applied Physics, Vol. 105, Issue 7; Conference: 53. annual conference on magnetism and magnetic materials, Austin, TX (United States), 10-14 Nov 2008; Other Information: DOI: 10.1063/1.3072024; (c) 2009 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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