Elongation of extreme ultraviolet (at 13.5 nm) emission with time-of-flight controlled discharges and lateral fuel injection

Journal Article · Mon Sep 01 04:00:00 UTC 2008 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2975211· OSTI ID:21182594

Hosokai, Tomonao; Hotta, Eiki; Horioka, Kazuhiko ^[1]; Yokoyama, Takuma; Sato, Hiroto ^[2]; Zhidkov, Alexei ^[3]

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1. Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Yokohama, Kanagawa 226-8502 (Japan)
2. Extreme Ultraviolet Lithography System Development Association (EUVA), R and D Center, Gotenba 1-90 Komakado, Gotenba, Shizuoka 412-0038 (Japan)
3. Central Research Institute of Electric Power Industry, 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196 (Japan)

A way toward a quasicontinuous extreme ultraviolet (EUV) radiation source is proposed and explored. Tin and lithium vapor discharges with the lateral laser-ablation injection are experimentally studied as possible efficient sources of quasicontinuous emission of EUV radiation at a wavelength of 13.5 nm. It is shown that the time-of-flight control of optimal plasma parameters by means of varying ablating laser pulse parameters provides a considerable elongation of maximal-power EUV emission with an overall efficiency of 0.1% and with an energy output exceeding 1% of the energy deposited in the discharge plasma. Along with a high average power and a stable position, such an emitter may have its size small enough to be used in the projection lithography.

• OSTI ID: 21182594
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 5 Vol. 104; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ABLATION
ELECTRIC DISCHARGES
EXTREME ULTRAVIOLET RADIATION
LASERS
LITHIUM
PLASMA
PLASMA PRODUCTION
PULSES
RADIATION SOURCES
TIME-OF-FLIGHT METHOD
TIN
VAPORS
WAVELENGTHS