Directional ion emission from thin films under femtosecond laser irradiation

Journal Article · Mon Mar 09 00:00:00 EDT 2009 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3095851· OSTI ID:21176023

Williams, Gareth O; Favre, Sebastian; O'Connor, Gerard M ^[1]

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1. NCLA, School of Physics, National University of Ireland, Galway, University Rd., Galway (Ireland)

Thin films of nickel have been irradiated using femtosecond laser pulses in vacuum. Subsequent emission of plasma ions is diagnosed using an ion probe. Angular distributions of the emitted ions are presented for a range of target film thicknesses. Data are compared to the Anisimov model of plasma expansion [S. I. Anisimov, D. Bauerle, and B. S. Luk'yanchuk, Phys. Rev. B 48, 12076 (1993)]. The tendency of the ions to be ejected at small angles to the normal of the target surface is explained in terms of the initial conditions of the plume. Results are explained in terms of the initial shape and adiabatic index of the plasma.

• OSTI ID: 21176023
• Journal Information: Applied Physics Letters, Vol. 94, Issue 10; Other Information: DOI: 10.1063/1.3095851; (c) 2009 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ANGULAR DISTRIBUTION
ION EMISSION
ION PROBES
LASER RADIATION
LASERS
NICKEL
PLASMA
PLASMA EXPANSION
PLASMA PRODUCTION
THIN FILMS