Response to 'Comment on 'Pinch current limitation effect in plasma focus'' [Appl. Phys. Lett. 94, 076101 (2009)]
- Institute for Plasma Focus Studies, 32 Oakpark Drive, Chadstone, Victoria 3148, Australia and National Institute of Education, Nanyang Technological University, Singapore 637616 (Singapore)
- INTI International University College, 71800 Nilai (Malaysia)
The main point of the comment [Appl. Phys. Lett. 94, 076101 (2009)] is that Eq. (2) and consequentially Eq. (3) of the commented paper [Appl. Phys. Lett. 92, 021503 (2008)] require correction. The alternative equation suggested in the comment is derived using Kirchhoff's voltage rule. The comment consider only the energy distribution in the inductive components and the resultant equation confirms a progressive lowering of the I{sub pinch}/I{sub peak} ratio as the static inductance L{sub 0} is reduced, lowering from 0.87 to 0.31 as L{sub 0} is reduced from 100 to 5 nH according to the revised formula corresponding to Eq. (3), compared to 0.63-0.25 according to Eq. (3). This progressive lowering of the ratio I{sub pinch}/I{sub peak} due to the inductive energy distribution is one of two factors responsible for the pinch current limitation. The other factor is the progressive reduction in the L-C interaction time compared to the current dip duration denoted by {delta}{sub cap} in Eq. (2). The comment does not deal with {delta}{sub cap} at all; hence, its conclusion based on inductive energy distribution only is not useful, since in the low L{sub 0} region when pinch current limitation begins to manifest, {delta}{sub cap} becomes more and more the dominant factor. In any case, the results of the paper do not depend on Eqs. (2) and (3), which are used in the paper only for illustrative purposes.
- OSTI ID:
- 21175981
- Journal Information:
- Applied Physics Letters, Vol. 94, Issue 7; Other Information: DOI: 10.1063/1.3081405; (c) 2009 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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