Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films

Journal Article · Mon Nov 10 00:00:00 EST 2008 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2999592· OSTI ID:21175747

Chou, H S; Huang, J C; Chang, L W ^[1]; Nieh, T G ^[2]

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1. Department of Materials and Optoelectronic Science, Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung 804, Taiwan (China)
2. Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996 (United States)

Ternary Zr-Cu-Ti system, especial with a high Ti content, is normally difficult to be fully vitrified. In this paper, we demonstrate that cosputtering can produce amorphous Zr-Cu-Ti thin films with an excessive Ti content even as high as 19%. Sub-T{sub g} annealing of the film induces the formation of medium-range-ordered clusters and to raise the nanohardness by 35% to 6.6 GPa. The promising mechanical properties of the sub-T{sub g} annealed Zr{sub 52}Cu{sub 29}Ti{sub 19} films offer great potential for microelectromechanical system applications.

• OSTI ID: 21175747
• Journal Information: Applied Physics Letters, Vol. 93, Issue 19; Other Information: DOI: 10.1063/1.2999592; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AMORPHOUS STATE
ANNEALING
COPPER ALLOYS
HARDNESS
INTERMETALLIC COMPOUNDS
METALLIC GLASSES
NANOSTRUCTURES
PRESSURE RANGE GIGA PA
SPUTTERING
TERNARY ALLOY SYSTEMS
THIN FILMS
TITANIUM ALLOYS
VITRIFICATION
ZIRCONIUM ALLOYS