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Title: Ultrafast imaging of transient electronic plasmas produced in conditions of femtosecond waveguide writing in dielectrics

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.2988275· OSTI ID:21175600
; ; ; ; ;  [1]
  1. Laser Processing Group, Instituto de Optica, C.S.I.C., Serrano 121, 28006 Madrid (Spain)

Femtosecond laser-induced plasmas in bulk dielectrics are imaged under waveguide writing conditions, for different polarizations, pulse durations, and processing depths, and their temporal evolution is measured using ultrafast pump-probe microscopy. The irradiation beam profile is elliptically shaped yielding a disklike focal volume. We demonstrate for doped phosphate glass that increasing the pulse duration improves the spatial distribution of deposited energy by minimizing beam filamentation and prefocal depletion effects. As a consequence, energy deposition in the desired volume is greatly enhanced. Our results identify key parameters for optimizing femtosecond laser processing of dielectrics and different strategies to minimize energy loss channels.

OSTI ID:
21175600
Journal Information:
Applied Physics Letters, Vol. 93, Issue 12; Other Information: DOI: 10.1063/1.2988275; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English