Ultrafast imaging of transient electronic plasmas produced in conditions of femtosecond waveguide writing in dielectrics
- Laser Processing Group, Instituto de Optica, C.S.I.C., Serrano 121, 28006 Madrid (Spain)
Femtosecond laser-induced plasmas in bulk dielectrics are imaged under waveguide writing conditions, for different polarizations, pulse durations, and processing depths, and their temporal evolution is measured using ultrafast pump-probe microscopy. The irradiation beam profile is elliptically shaped yielding a disklike focal volume. We demonstrate for doped phosphate glass that increasing the pulse duration improves the spatial distribution of deposited energy by minimizing beam filamentation and prefocal depletion effects. As a consequence, energy deposition in the desired volume is greatly enhanced. Our results identify key parameters for optimizing femtosecond laser processing of dielectrics and different strategies to minimize energy loss channels.
- OSTI ID:
- 21175600
- Journal Information:
- Applied Physics Letters, Vol. 93, Issue 12; Other Information: DOI: 10.1063/1.2988275; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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