Ultrathin epitaxially grown bismuth (111) membranes

Journal Article · Mon Sep 01 00:00:00 EDT 2008 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2976558· OSTI ID:21175554

Payer, T; Rajkovic, I; Ligges, M; Linde, D von der ^[1]; Horn-von Hoegen, M; Meyer zu Heringdorf, F -J ^[1]

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1. Fachbereich Physik, Universitaet Duisburg-Essen, Lotharstrasse 1, 47057 Duisburg (Germany)

An ex situ cleaning and etching technique was applied to NaCl single crystals to prepare atomically flat and clean NaCl surfaces. These were used as substrates for molecular beam epitaxial growth of ultrathin continuous Bi(111) films. The high film quality - as studied with low energy electron diffraction, atomic force microscopy, and transmission electron diffraction - is attributed to the commensurate 10:7 ratio of the lattice constants. Dissolving the NaCl substrates in water allows the fabrication of freestanding 20 nm thin Bi(111) membranes of centimeter size.

• OSTI ID: 21175554
• Journal Information: Applied Physics Letters, Vol. 93, Issue 9; Other Information: DOI: 10.1063/1.2976558; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ATOMIC FORCE MICROSCOPY
BISMUTH
CLEANING
CRYSTAL GROWTH
ELECTRON DIFFRACTION
ETCHING
FABRICATION
FILMS
LATTICE PARAMETERS
MEMBRANES
MOLECULAR BEAM EPITAXY
MONOCRYSTALS
SODIUM CHLORIDES
SUBSTRATES
WATER