Interfacial structure and defect analysis of nonpolar ZnO films grown on R-plane sapphire by molecular beam epitaxy
- Centre de Recherche sur l'Hetero-Epitaxie et ses Applications, Centre National de la Recherche Scientifique, CRHEA-CNRS, Rue Bernard Gregory, Sophia Antipolis, 06560 Valbonne (France)
The interfacial relationship and the microstructure of nonpolar (11-20) ZnO films epitaxially grown on (1-102) R-plane sapphire by molecular beam epitaxy are investigated by transmission electron microscopy. The already-reported epitaxial relationships [1-100]{sub ZnO} parallel [11-20]{sub sapphire} and <0001>{sub ZnO} parallel [-1101]{sub sapphire} are confirmed, and we have determined the orientation of the Zn-O (cation-anion) bond along [0001]{sub ZnO} in the films as being uniquely defined with respect to a reference surface Al-O bond on the sapphire substrate. The microstructure of the films is dominated by the presence of I{sub 1} basal stacking faults [density=(1-2)x10{sup 5} cm{sup -1}] and related partial dislocations [density=(4-7)x10{sup 10} cm{sup -2}]. It is shown that I{sub 1} basal stacking faults correspond to dissociated perfect dislocations, either c or a+c type.
- OSTI ID:
- 21137157
- Journal Information:
- Journal of Applied Physics, Vol. 103, Issue 8; Other Information: DOI: 10.1063/1.2905220; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Nonpolar ZnO film growth and mechanism for anisotropic in-plane strain relaxation
Interface structure and anisotropic strain relaxation of nonpolar wurtzite (1120) and (1010) orientations: ZnO epilayers grown on sapphire