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Title: Subcutoff microwave driven plasma ion sources for multielemental focused ion beam systems

Journal Article · · Review of Scientific Instruments
DOI:https://doi.org/10.1063/1.2943341· OSTI ID:21123947
; ;  [1]
  1. Department of Physics, Indian Institute of Technology, Kanpur 208016 (India)

A compact microwave driven plasma ion source for focused ion beam applications has been developed. Several gas species have been experimented including argon, krypton, and hydrogen. The plasma, confined by a minimum B multicusp magnetic field, has good radial and axial uniformity. The octupole multicusp configuration shows a superior performance in terms of plasma density ({approx}1.3x10{sup 11} cm{sup -3}) and electron temperature (7-15 eV) at a power density of 5-10 W/cm{sup 2}. Ion current densities ranging from a few hundreds to over 1000 mA/cm{sup 2} have been obtained with different plasma electrode apertures. The ion source will be combined with electrostatic Einzel lenses and should be capable of producing multielemental focused ion beams for nanostructuring and implantations. The initial simulation results for the focused beams have been presented.

OSTI ID:
21123947
Journal Information:
Review of Scientific Instruments, Vol. 79, Issue 6; Other Information: DOI: 10.1063/1.2943341; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
Country of Publication:
United States
Language:
English