Hydrogen plasma and atomic oxygen treatments of diamond: Chemical versus morphological effects

Journal Article · Mon Jun 09 00:00:00 EDT 2008 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2939561· OSTI ID:21120819

Shpilman, Z ^[1]; Gouzman, I; Grossman, E ^[1]; Akhvlediani, R; Hoffman, A ^[2]

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1. Space Environment Section, Soreq NRC, Yavne 81800 (Israel)
2. Schulich Department of Chemistry, Technion, Haifa 32000 (Israel)

Chemical bonding and morphology of chemical vapor deposited diamond films were studied using high resolution electron energy loss spectroscopy and atomic force microscopy, following hydrogen plasma and atomic oxygen exposures. The hydrogen plasma exposure resulted in preferential etching of nondiamond carbon phases, selective etching of diamond facets, and termination of the diamond surfaces by sp{sup 3}-C-H species. Exposure to atomic oxygen, on the other hand, produced significant chemical changes resulting in oxidized hydrocarbon ill defined top layer, while the morphology of the surface remained almost unchanged.

• OSTI ID: 21120819
• Journal Information: Applied Physics Letters, Vol. 92, Issue 23; Other Information: DOI: 10.1063/1.2939561; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ATOMIC FORCE MICROSCOPY
CHEMICAL BONDS
CHEMICAL VAPOR DEPOSITION
DIAMONDS
ELECTRONS
ENERGY-LOSS SPECTROSCOPY
ETCHING
HYDROCARBONS
HYDROGEN
LAYERS
MORPHOLOGY
OXYGEN
PLASMA
SURFACES
THIN FILMS