Two dimensional expansion effects on angular distribution of 13.5 nm in-band extreme ultraviolet emission from laser-produced Sn plasma
- Department of Mechanical and Aerospace Engineering and the Center for Energy Research, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093-0438 (United States)
The angular distribution of extreme ultraviolet emission at 13.5 nm within 2% bandwidth was characterized for laser irradiated, planar, Sn targets at prototypic conditions for a lithography system. We have found that two dimensional plasma expansion plays a key role in the distribution of in-band 13.5 nm emission under these conditions. The angular distribution was found to have two peaks at 45 deg. and 15 deg. This complex angular distribution arises from the shape of both the emitting plasma and the surrounding absorbing plasma. This research reveals that the detailed angular distribution can be important to the deduction of conversion efficiency.
- OSTI ID:
- 21120772
- Journal Information:
- Applied Physics Letters, Vol. 92, Issue 22; Other Information: DOI: 10.1063/1.2938717; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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