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Title: Scotin: A new p63 target gene expressed during epidermal differentiation

Journal Article · · Biochemical and Biophysical Research Communications
 [1];  [2];  [1];  [3];  [4];  [1];  [1]
  1. IDI-IRCCS Biochemistry Laboratory, c/o University of Tor Vergata, Department of Experimental Medicine, Via Montpellier 1, 00133 Rome (Italy)
  2. Inserm European Associated Laboratory, Department of Surgery and Molecular Oncology, University of Dundee, Inserm U858, CR-UK Cell Transformation Research Group, Dundee (United Kingdom)
  3. Medical Research Council, Toxicology Unit, Hodgkin Building, Leicester University, Lancaster Road, P.O. Box 138, Leicester LE1 9HN (United Kingdom)
  4. Ninewells Hospital and Medical School, Department of Surgery and Molecular Oncology, CRC Cell Transformation Group, Dundee DD1 9SY (United Kingdom)

p63, a member of the p53 family, is transcribed from two different promoters giving rise to two different proteins: TAp63 that contains the N-terminal transactivation domain and {delta}N that lacks this domain. In this article we describe a new target gene Scotin induced by TAp63 during epithelial differentiation. This gene was previously isolated as a p53-inducible proapoptotic gene and the protein is located in the endoplasmic reticulum and in the nuclear membrane. Scotin expression is induced in response to endoplasmic reticulum (ER) stress in a p53 dependent or independent manner. We detected Scotin upregulation in primary keratinocyte cell lines committed to differentiate. In this paper we also show that Scotin is expressed in the supra basal layer of the epidermis in parallel with TAp63, but not {delta}Np63 expression. We conclude that Scotin is a new p63 target gene induced during epithelial differentiation, a complex process that also involves ER stress induction.

OSTI ID:
21043642
Journal Information:
Biochemical and Biophysical Research Communications, Vol. 367, Issue 2; Other Information: DOI: 10.1016/j.bbrc.2007.12.115; PII: S0006-291X(07)02700-3; Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved; Country of input: International Atomic Energy Agency (IAEA); ISSN 0006-291X
Country of Publication:
United States
Language:
English

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