A Two Magnetron Sputter Deposition Chamber Equipped with an Additional Ion Gun for in situ Observation of Thin Film Growth and Surface Modification by Synchrotron Radiation Scattering
- Forschungszentrum Rossendorf, P.O. Box 510119, 01314 Dresden (Germany)
We report the design of a sputter deposition chamber for the in situ study of film growth and modification by synchrotron x-ray diffraction and reflectivity. The chamber is sealed with four Be-windows allowing unhindered scattering access of -2 up to +50 degrees off-plane and -2.9 up to +65 degrees in-plane, respectively. The chamber fits into a standard six-circle diffractometer from HUBER which is relatively widespread in synchrotron laboratories. Two commercial miniature magnetrons with additional gas inlets allow for the deposition of compound films and multilayers. Substrate heating up to 950 deg. C and different substrate bias voltages are possible. An additional ion gun up to 6 keV and 10 {mu}A allows post-deposition ion irradiation with light atoms or energetic ion bombardment during sputter deposition. The performance of the chamber was tested with the deposition of MAX phase Ti2AlN and with the off-sputtering of a thin Pt film.
- OSTI ID:
- 21043374
- Journal Information:
- AIP Conference Proceedings, Vol. 879, Issue 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436422; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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