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Title: Study of radial growth rate and size control of silicon nanocrystals in square-wave-modulated silane plasmas

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.2784294· OSTI ID:21016146
; ;  [1]
  1. LPICM, Ecole Polytechnique, 91128 Palaiseau (France)

The growth of silicon nanocrystals in high pressure and high dilution silane plasmas is investigated by using the temporal evolution of the self-bias on the radio frequency electrode and transmission electron microscopy. A square-wave-modulated plasma was used in order to control the growth of monodispersed nanoparticles with sizes smaller than 12 nm. To this end, the plasma on time was kept below 1 s. The radial growth rate of nanoparticles was varied in the range from 7.5 to 75 nm/s by changing silane partial pressure. Nanoparticles grown in silane-helium discharges have been found amorphous while they are crystalline in silane-hydrogen-argon discharges. Surprisingly, the crystallization in the gaseous phase does not depend on how slow or fast the particles grow but on the presence of atomic hydrogen.

OSTI ID:
21016146
Journal Information:
Applied Physics Letters, Vol. 91, Issue 11; Other Information: DOI: 10.1063/1.2784294; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English