Quantum lithography with classical light: Generation of arbitrary patterns

Journal Article · Fri Jun 15 00:00:00 EDT 2007 · Physical Review. A

DOI:https://doi.org/10.1103/PHYSREVA.75.065803· OSTI ID:21000564

Qingqing, Sun; Zubairy, M Suhail ^[1]; Hemmer, Philip R ^[2]

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1. Department of Physics and Institute of Quantum Studies, Texas A and M University, College Station, Texas 77843-4242 (United States)
2. Department of Electrical and Computer Engineering, Texas A and M University, College Station, Texas 77843-3128 (United States)

Based on our previous scheme [Hemmer et al., Phys. Rev. Lett. 96, 163603 (2006)] we show the procedures to obtain any one- or two-dimensional pattern by multiple exposures. A key modification to the resonance condition is made to achieve subwavelength pattern resolution. The level separation of the substrate does not pose an upper limit to the frequency summation. So the fundamental frequency can be high and the number of Fourier terms can be large, making our scheme very suitable for subwavelength arbitrary patterns.

• OSTI ID: 21000564
• Journal Information: Physical Review. A, Vol. 75, Issue 6; Other Information: DOI: 10.1103/PhysRevA.75.065803; (c) 2007 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1050-2947
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
IMAGES
MODIFICATIONS
NANOSTRUCTURES
OPTICS
RESOLUTION
RESONANCE
SUBSTRATES
WAVELENGTHS