Molecular dynamics simulation study on substrate temperature dependence of sputtering yields for an organic polymer under ion bombardment

Journal Article · Thu Feb 15 00:00:00 EST 2007 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2433132· OSTI ID:20982711

Yamashiro, Masashi; Yamada, Hideaki; Hamaguchi, Satoshi ^[1]

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1. Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871 (Japan)

Substrate temperature dependence of sputtering yields in organic polymer etching processes has been examined with the use of molecular dynamics (MD) simulations. The simulation results indicate that structural weakness arising from high substrate temperatures alone is not sufficient to account for the experimentally observed strong dependence of sputtering yields on substrate temperatures. In other words, thermal desorption is likely to increase significantly at high substrate temperatures in reactive ion etching processes of organic polymers.

• OSTI ID: 20982711
• Journal Information: Journal of Applied Physics, Vol. 101, Issue 4; Other Information: DOI: 10.1063/1.2433132; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
36 MATERIALS SCIENCE
DESORPTION
ETCHING
ION BEAMS
MOLECULAR DYNAMICS METHOD
ORGANIC POLYMERS
SIMULATION
SPUTTERING
SUBSTRATES
TEMPERATURE DEPENDENCE