skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Efficient focusing of hard x rays to 25 nm by a total reflection mirror

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.2436469· OSTI ID:20971800
; ; ; ; ; ; ; ; ; ;  [1]
  1. Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871 (Japan)

Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tunable focusing. The authors have developed a fabrication system for hard x-ray mirrors by developing elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. By using an ultraprecisely figured mirror, they realized hard x-ray line focusing with a beam width of 25 nm at 15 keV. The focusing test was performed at the 1-km-long beamline of SPring-8.

OSTI ID:
20971800
Journal Information:
Applied Physics Letters, Vol. 90, Issue 5; Other Information: DOI: 10.1063/1.2436469; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English