PIII Plasma Density Enhancement by a New DC Power Source
- Instituto Nacional de Investigaciones Nucleares, AP 18-1027, 11801 Mexico D.F. (Mexico)
- Instituto Tecnologico de Toluca, AP 890, Toluca (Mexico)
In practical terms, those plasmas produced by a DC voltage power supply do not attain densities above the 108 to 109 cm-3 band. Here we present a power supply, controlled in current and voltage, which has been successfully designed and constructed delivering plasma densities in the orders of 109 - 1010 cm-3. Its experimental performance test was conducted within one toroidal and one cylindrical chambers capable of 29 and 35 litres, respectively, using nitrogen gas. The DC plasma was characterized by a double electric probe. Several physical phenomena present in the PIII process have been keenly investigated including plasma sheath dynamics, interaction of plasma and surface, etc. In this paper we analyze the effect of the implantation voltage, plasma density and pulse time in the PIII average heating power and fluence density.
- OSTI ID:
- 20898801
- Journal Information:
- AIP Conference Proceedings, Vol. 875, Issue 1; Conference: 16. IAEA technical meeting on research using small fusion devices; 11. Latin American workshop on plasma physics, Mexico City (Mexico), 30 Nov - 3 Dec 2005; 5-9 Dec 2005; Other Information: DOI: 10.1063/1.2405935; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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