Photomechanical response of azobenzene/organophilic mica complexes
To clarify whether photomechanical response is limited to the special combination of azobenzene (AzBz)/organophilic tetrasilicic mica (TSM) complexes, another swelling synthetic fluoro-mica, lithium taeniolite, was used as a starting host for AzBz/organophilic mica complexes. Basal spacings of organophilic taeniolites (o-TNs) prepared by the intercalation of trimethylalkylammonium (TMAA) into the TN increased linearly as alkyl chain length in TMAA increased from 2.44 to 2.86 nm. This indicates paraffin-type arrangement of TMAA in the TN gallery. Intercalation of AzBz to o-TN was performed via the gas phase at 100 deg. C. Photoresponses of AzBz/o-TN complexes were examined by XRD measurement under alternate UV and visible light irradiation. A decrease in basal spacing was observed under UV irradiation, and an increase was under visible light irradiation. Basal spacing change was 0.09-0.18 nm, which corresponds to 3-5% of the AzBz/o-TN basal spacing. These results indicate that reversible photomechanical response is a general phenomenon for AzBz/organophilic mica complexes.
- OSTI ID:
- 20884631
- Journal Information:
- Materials Research Bulletin, Vol. 38, Issue 15; Other Information: DOI: 10.1016/j.materresbull.2003.09.012; PII: S0025540803002551; Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
- Country of Publication:
- United States
- Language:
- English
Similar Records
Preparation and optical characteristics of layered perovskite-type lead-bromide-incorporated azobenzene chromophores
Azobenzene-based organic salts with ionic liquid and liquid crystalline properties