Deposition of hydroxyapatite thin films by Nd:YAG laser ablation: a microstructural study
- National Institute of Materials Physics, P.O. Box MG-7, Magurele, RO-76900, Bucharest (Romania)
- National Institute of Lasers, Plasma and Radiation Physics, P.O. Box MG-26, Magurele, RO-76900, Bucharest (Romania)
- Aristotle University of Thessaloniki, Department of Physics, GR-54124 Thessaloniki (Greece)
Hydroxyapatite (HA) thin films has been successfully deposited by Nd:YAG laser ablation at {lambda} = 532 nm. The morphology and microstructure of the deposited layers was studied by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and high resolution electron microscopy (HREM). Polycrystalline HA films were directly obtained with the substrate at 300 deg. C and without introducing water vapors in the deposition chamber. Electron paramagnetic resonance (EPR) measurements show that the oxygen stoichiometry in the HA films is also maintained. Depositions performed at {lambda} = 335 nm laser wavelength and 300 deg. C substrate temperature resulted in polycrystalline layers of mixed composition of HA and tricalciumphosphate (TCP)
- OSTI ID:
- 20883057
- Journal Information:
- Materials Research Bulletin, Vol. 39, Issue 13; Other Information: DOI: 10.1016/j.materresbull.2004.07.006; PII: S0025-5408(04)00229-6; Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
- Country of Publication:
- United States
- Language:
- English
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