Uniformity of postprocessing of dense nanotube arrays by neutral and ion fluxes

Journal Article · Mon Nov 27 00:00:00 EST 2006 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2388941· OSTI ID:20880112

Levchenko, I; Ostrikov, K; Tam, E ^[1]

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1. Plasma Nanoscience at Complex Systems, School of Physics, University of Sydney, Sydney, New South Wales 2006 (Australia)

The advantages of using low-temperature plasma environments for postprocessing of dense nanotube arrays are shown by means of multiscale hybrid numerical simulations. By controlling plasma-extracted ion fluxes and varying the plasma and sheath parameters, one can selectively coat, dope, or functionalize different areas on nanotube surfaces. Conditions of uniform deposition of ion fluxes over the entire nanotube surfaces are obtained for different array densities. The plasma route enables a uniform processing of lateral nanotube surfaces in very dense (with a step-to-height ratio of 1:4) arrays, impossible via the neutral gas process wherein radical penetration into the internanotube gaps is poor.

• OSTI ID: 20880112
• Journal Information: Applied Physics Letters, Vol. 89, Issue 22; Other Information: DOI: 10.1063/1.2388941; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
36 MATERIALS SCIENCE
CARBON
IONS
NANOTUBES
PLASMA
SIMULATION
SURFACE TREATMENTS