Combined electron and focused ion beam system for improvement of secondary ion yield in secondary ion mass spectrometry instrument

Journal Article · Mon Oct 16 00:00:00 EDT 2006 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2362996· OSTI ID:20880048

Ji, L; Ji, Q; Leung, K -N; Gough, R A ^[1]

---

1. Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720 (United States)

Using a combined electron and focused ion beam system to improve performance of secondary ion mass spectrometry instruments has been investigated experimentally. The secondary ion yield for an Al target has been enhanced to about one order of magnitude higher with the postionization induced by the low energy electrons in the combined beam. It can be further improved with the increase of electron beam current. When the combined beam is applied to insulating targets, sample charging is also eliminated. For Teflon targets, the secondary ion signal is increased by more than a factor of 20.

• OSTI ID: 20880048
• Journal Information: Applied Physics Letters, Vol. 89, Issue 16; Other Information: DOI: 10.1063/1.2362996; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ELECTRON BEAMS
ION BEAMS
ION MICROPROBE ANALYSIS
IONIZATION
MASS SPECTROSCOPY
PERFORMANCE
TEFLON