Influence of in situ ultrasound treatment during ion implantation on formation of silver nanoparticles in silica

Journal Article · Wed Feb 01 00:00:00 EST 2006 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2171773· OSTI ID:20787870

Romanyuk, Andriy; Spassov, Vladislav; Melnik, Viktor ^[1]

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1. Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel (Switzerland)

We report on the effect of in situ ultrasound treatment on the clustering process of silver atoms in ion-implanted SiO{sub 2}. Cross-sectional transmission electron microscopy shows single-crystal Ag spheres with an increased cluster size when prepared using ultrasound vibrations. Time-of-flight secondary-ion-mass spectrometry demonstrates an enhanced yield of [Ag{sub 2}]{sup 216} complexes in structures treated with acoustic waves. An analysis of the influence of ultrasound on defect reaction kinetics as well as on different stages of the clustering process is performed.

• OSTI ID: 20787870
• Journal Information: Journal of Applied Physics, Vol. 99, Issue 3; Other Information: DOI: 10.1063/1.2171773; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CRYSTAL DEFECTS
ION IMPLANTATION
MASS SPECTRA
MASS SPECTROSCOPY
MONOCRYSTALS
NANOSTRUCTURES
PARTICLES
REACTION KINETICS
SILICA
SILICON OXIDES
SILVER
SOUND WAVES
SPHERES
TIME-OF-FLIGHT METHOD
TRANSMISSION ELECTRON MICROSCOPY