Electrical description of a magnetic pole enhanced inductively coupled plasma source: Refinement of the transformer model by reverse electromagnetic modeling
- European Commission-Joint Research Centre, IHCP, TP 203, Via E. Fermi 1, 21020 Ispra (Vatican City State, Holy See,) (Italy)
The magnetic pole enhanced inductively coupled source (MaPE-ICP) is an innovative low-pressure plasma source that allows for high plasma density and high plasma uniformity, as well as large-area plasma generation. This article presents an electrical characterization of this source, and the experimental measurements are compared to the results obtained after modeling the source by the equivalent circuit of the transformer. In particular, the method applied consists in performing a reverse electromagnetic modeling of the source by providing the measured plasma parameters such as plasma density and electron temperature as an input, and computing the total impedance seen at the primary of the transformer. The impedance results given by the model are compared to the experimental results. This approach allows for a more comprehensive refinement of the electrical model in order to obtain a better fitting of the results. The electrical characteristics of the system, and in particular the total impedance, were measured at the inductive coil antenna (primary of the transformer). The source was modeled electrically by a finite element method, treating the plasma as a conductive load and taking into account the complex plasma conductivity, the value of which was calculated from the electron density and electron temperature measurements carried out previously. The electrical characterization of the inductive excitation source itself versus frequency showed that the source cannot be treated as purely inductive and that the effect of parasitic capacitances must be taken into account in the model. Finally, considerations on the effect of the magnetic core addition on the capacitive component of the coupling are made.
- OSTI ID:
- 20787862
- Journal Information:
- Journal of Applied Physics, Vol. 99, Issue 3; Other Information: DOI: 10.1063/1.2164536; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Modeling of profile effects for large area inductive coupled plasma sources
A 3-dimensional model for inductively coupled plasma etching reactors: Coil generated plasma asymmetries