Microwave plasma torch abatement of NF{sub 3} and SF{sub 6}
- Department of Molecular Science and Technology, Ajou University, San 5, Wonchon-Dong, Youngtong-Gu, Suwon 443-749 (Korea, Republic of)
An atmospheric pressure microwave plasma torch as a tool for fluorinated compounds (FCs) abatement was presented. Detailed experiments were conducted on the abatement of NF{sub 3} and SF{sub 6} in terms of destruction and removal efficiency (DRE) using Fourier transform infrared (FTIR). Swirl gas, compressed air for stable plasma, was tangentially injected into the microwave plasma torch and a mixture of N{sub 2}, NF{sub 3}, or SF{sub 6}, and C{sub 2}H{sub 4} was axially injected. The DRE of 99.1% for NF{sub 3} was achieved without an additive gas at the total flow rate of 50.1 liters per minute (lpm) by applying a microwave power of 1.4 kW. Also, a DRE of SF{sub 6} up to 90.1% was obtained at the total flow rate of 40.6 lpm using an applied microwave power of 1.4 kW. Experimental results indicate that the microwave plasma abatement device can successfully eliminate FCs in the semiconductor industry.
- OSTI ID:
- 20782584
- Journal Information:
- Physics of Plasmas, Vol. 13, Issue 3; Other Information: DOI: 10.1063/1.2182240; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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