Diffraction-limited two-dimensional hard-x-ray focusing at the 100 nm level using a Kirkpatrick-Baez mirror arrangement
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871 (Japan)
The spatial resolution of scanning x-ray microscopy depends on the beam size of focused x rays. Recently, nearly diffraction-limited line focusing has been achieved using elliptical mirror optics at the 100 nm level. To realize such focusing two-dimensionally in a Kirkpatrick-Baez system, the required accuracies of the mirror aligners in this system were estimated using optical simulators based on geometrical or wave-optical theories. A focusing unit fulfilling the required adjustment accuracies was constructed. The relationships between alignment errors and focused beam profiles were quantitatively examined at the 1 km long beamline (BL29XUL) of SPring-8 to be in good agreement with the simulation results.
- OSTI ID:
- 20723089
- Journal Information:
- Review of Scientific Instruments, Vol. 76, Issue 8; Other Information: DOI: 10.1063/1.2005427; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
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