Evaluation of crystallinity and film stress in yttria-stabilized zirconia thin films
- Curriculum of Applied and Material Science, University of North Carolina, Chapel Hill, North Carolina 27599 and RTI International, Center for Materials and Electronic Technologies, Research Triangle Park, North Carolina 27709 (United States)
Yttria (3 mol %)-stabilized zirconia (YSZ) thin films were deposited using radio frequency (rf) magnetron sputtering. The YSZ thin films were deposited over a range of temperatures (22-300 deg. C), pressures (5-25 mTorr), and gas compositions (Ar/O ratio). Initial studies characterized a select set of properties in relation to deposition parameters including: refractive index, structure, and film stress. X-ray diffraction (XRD) showed that the films are comprised of mainly monoclinic and tetragonal crystal phases. The film refractive index determined by prism coupling, depends strongly on deposition conditions and ranged from 1.959 to 2.223. Wafer bow measurements indicate that the sputtered YSZ films can have initial stress ranging from 86 MPa tensile to 192 MPa compressive, depending on the deposition parameters. Exposure to ambient conditions (25 deg. C, 75% relative humidity) led to large increase ({approx}100 MPa) in the compressive stress of the films. Environmental aging suggests the change in compressive stress was related to water vapor absorption. These effects were then evaluated for films formed under different deposition parameters with varying density (calculated packing density) and crystal structure (XRD)
- OSTI ID:
- 20723054
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 23, Issue 5; Other Information: DOI: 10.1116/1.2011403; (c) 2005 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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