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Title: Microstructure of Co-doped TiO{sub 2}(110) rutile by ion implantation

Abstract

Co-doped rutile TiO{sub 2} was synthesized by injecting Co ions into single crystal rutile TiO{sub 2} using high energy ion implantation. Microstructures of the implanted specimens were studied in detail using high-resolution transmission electron microscopy (HRTEM), energy dispersive x-ray spectroscopy, electron diffraction, and HRTEM image simulations. The spatial distribution and conglomeration behavior of the implanted Co ions, as well as the point defect distributions induced by ion implantation, show strong dependences on implantation conditions. Uniform distribution of Co ions in the rutile TiO{sub 2} lattice was obtained by implanting at 1075 K with a Co ion fluence of 1.25x10{sup 16} Co/cm{sup 2}. Implanting at 875 K leads to the formation of Co metal clusters. The precipitated Co metal clusters and surrounding TiO{sub 2} matrix exhibit the orientation relationships Co<110> parallel TiO{sub 2}[001] and Co{l_brace}111{r_brace} parallel TiO{sub 2}(110). A structural model representing the interface between Co metal clusters and TiO{sub 2} is developed based on HRTEM imaging and image simulations.

Authors:
; ; ; ;  [1]
  1. Pacific Northwest National Laboratory, P.O. Box 999, Richland, Washington 99352 (United States)
Publication Date:
OSTI Identifier:
20668268
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 97; Journal Issue: 7; Other Information: DOI: 10.1063/1.1866482; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CHEMICAL ANALYSIS; COBALT; COBALT IONS; DOPED MATERIALS; ELECTRON DIFFRACTION; FERROMAGNETIC MATERIALS; ION IMPLANTATION; MAGNETIC SEMICONDUCTORS; MICROSTRUCTURE; MOLECULAR CLUSTERS; MONOCRYSTALS; PRECIPITATION; RUTILE; SIMULATION; SPATIAL DISTRIBUTION; STRUCTURAL MODELS; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; VACANCIES; X-RAY SPECTROSCOPY

Citation Formats

Wang, C M, Shutthanandan, V, Thevuthasan, S, Droubay, T, and Chambers, S A. Microstructure of Co-doped TiO{sub 2}(110) rutile by ion implantation. United States: N. p., 2005. Web. doi:10.1063/1.1866482.
Wang, C M, Shutthanandan, V, Thevuthasan, S, Droubay, T, & Chambers, S A. Microstructure of Co-doped TiO{sub 2}(110) rutile by ion implantation. United States. https://doi.org/10.1063/1.1866482
Wang, C M, Shutthanandan, V, Thevuthasan, S, Droubay, T, and Chambers, S A. 2005. "Microstructure of Co-doped TiO{sub 2}(110) rutile by ion implantation". United States. https://doi.org/10.1063/1.1866482.
@article{osti_20668268,
title = {Microstructure of Co-doped TiO{sub 2}(110) rutile by ion implantation},
author = {Wang, C M and Shutthanandan, V and Thevuthasan, S and Droubay, T and Chambers, S A},
abstractNote = {Co-doped rutile TiO{sub 2} was synthesized by injecting Co ions into single crystal rutile TiO{sub 2} using high energy ion implantation. Microstructures of the implanted specimens were studied in detail using high-resolution transmission electron microscopy (HRTEM), energy dispersive x-ray spectroscopy, electron diffraction, and HRTEM image simulations. The spatial distribution and conglomeration behavior of the implanted Co ions, as well as the point defect distributions induced by ion implantation, show strong dependences on implantation conditions. Uniform distribution of Co ions in the rutile TiO{sub 2} lattice was obtained by implanting at 1075 K with a Co ion fluence of 1.25x10{sup 16} Co/cm{sup 2}. Implanting at 875 K leads to the formation of Co metal clusters. The precipitated Co metal clusters and surrounding TiO{sub 2} matrix exhibit the orientation relationships Co<110> parallel TiO{sub 2}[001] and Co{l_brace}111{r_brace} parallel TiO{sub 2}(110). A structural model representing the interface between Co metal clusters and TiO{sub 2} is developed based on HRTEM imaging and image simulations.},
doi = {10.1063/1.1866482},
url = {https://www.osti.gov/biblio/20668268}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 7,
volume = 97,
place = {United States},
year = {Fri Apr 01 00:00:00 EST 2005},
month = {Fri Apr 01 00:00:00 EST 2005}
}