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Title: (In,Ga)As sidewall quantum wires on shallow-patterned InP (311)A

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.1862763· OSTI ID:20668247
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  1. eiTT/COBRA Inter-University Research Institute, Eindhoven University of Technology, 5600 MB Eindhoven (Netherlands)

(In,Ga)As sidewall quantum wires (QWires) are realized by chemical beam epitaxy along [01-1] mesa stripes on shallow-patterned InP (311)A substrates. The QWires exhibit strong lateral carrier confinement due to larger thickness and In composition compared to the adjacent quantum wells, as determined by cross-sectional scanning-tunneling microscopy and microphotoluminescence (micro-PL) spectroscopy. The PL of the (In,Ga)As QWires with InP and quaternary (Ga,In)(As,P) barriers reveals narrow linewidth, high efficiency, and large lateral carrier confinement energies of 60-70 meV. The QWires are stacked in growth direction with identical PL peak emission energy. The PL emission energy is not only controlled by the (In,Ga)As layer thickness but also by the patterned mesa height. Stacked (In,Ga)As QWires with quaternary barriers exhibit room temperature PL emission at 1.55 {mu}m in the technologically important wavelength region for telecommunication applications.

OSTI ID:
20668247
Journal Information:
Journal of Applied Physics, Vol. 97, Issue 6; Other Information: DOI: 10.1063/1.1862763; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English