Microbeam X-Ray Standing Wave and High Resolution Diffraction

Journal Article · Wed May 12 00:00:00 EDT 2004 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.1757972· OSTI ID:20652795

Kazimirov, A; Bilderback, D H; Huang, R ^[1]; Sirenko, A ^[2]

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1. Cornell High Energy Synchrotron Source (CHESS), Cornell University, Ithaca, NY 14853 (United States)
2. New Jersey Institute of Technology, Department of Physics, Newark, NJ 07102 (United States)

Post-focusing collimating optics are introduced as a tool to condition X-ray microbeams for the use in high-resolution X-ray diffraction and scattering techniques. As an example, a one-bounce imaging capillary and miniature Si(004) channel-cut crystal were used to produce a microbeam with 10 {mu}m size and an ultimate angular resolution of 2.5 arc sec. This beam was used to measure the strain in semiconductor microstructures by using X-ray high resolution diffraction and standing wave techniques to {delta}d/d < 5x10-4.

• OSTI ID: 20652795
• Journal Information: AIP Conference Proceedings, Vol. 705, Issue 1; Conference: 8. international conference on synchrotron radiation instrumentation, San Francisco, CA (United States), 25-29 Aug 2003; Other Information: DOI: 10.1063/1.1757972; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CAPILLARIES
COLLIMATORS
CRYSTALS
FOCUSING
METERS
MICROSTRUCTURE
OPTICS
RESOLUTION
SEMICONDUCTOR MATERIALS
STANDING WAVES
STRAINS
X-RAY DIFFRACTION