Highly accurate coating composition control during co-sputtering, based on controlling plasma chromaticity
- Plasma Quest Limited, Unit 1B Rose Estate, Osborn Way, Hook RG27 9UT, (United Kingdom)
Highly accurate control of sputtering processes is of paramount importance to industry. Plasma diagnostic equipment based on spectroscopic methods such as optical emission spectroscopy (OES) have been commercially available for many years and have the ability to deliver a high level of accuracy. Despite this, their complexity, demand for operator time, and disregard for the vast majority of the optical emission spectrum have rendered them as unpopular, and they are rarely used in manufacturing lines. This article introduces the measurement of the chromaticity of the plasma as a new method of analysis, as an alternative to OES. This method is simple, while maintaining a high level of sensitivity. Chromaticity monitors a wide range of the optical emission spectrum, obtaining a large amount of process information. It also averages and simplifies the data, making them easier to analyze.
- OSTI ID:
- 20637022
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 23, Issue 2; Other Information: DOI: 10.1116/1.1854694; (c) 2005 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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