Dynamic control of substrate bias for highly c-axis textured thin ferromagnetic CoCrTa film in inductively coupled plasma-assisted sputtering
- Department of Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292 (Japan)
This study shows highly c-axis textured thin ferromagnetic Co-based alloy (CoCrTa) film growth in inductively coupled plasma (ICP)-assisted sputtering with an internal coil with an insulated surface. Dynamic control of the substrate bias achieved highly c-axis textured CoCrTa film with a thickness of 70 nm in 3 min depositions on a Si substrate. The prepared film showed a smooth, dense surface consisting of small crystal grains. The film had a perpendicular magnetic coercivity of 1030 Oe and coercive squareness of 0.36. ICP-assisted sputtering with an internal coil with an insulated surface enabled higher-density ({>=}1.0x10{sup 11} cm{sup -3}) plasma with lower space potential ({<=}30 V) compared to ICP-assisted sputtering with bare coil systems. Therefore, the proposed bias control is quite effective for textured growth of thinner Co layers via the effect of a high flux of ions with proper energies. This method can be a candidate for the deposition technique of c-axis textured films as perpendicular magnetic recording media.
- OSTI ID:
- 20636954
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 23, Issue 1; Other Information: DOI: 10.1116/1.1827626; (c) 2005 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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