Production of high-density capacitively coupled radio-frequency discharge plasma by high-secondary-electron-emission oxide
- Department of Electrical and Electronic Engineering, Saga University, 1 Honjo-machi, Saga 840-8502 (Japan)
High-density capacitively coupled radio-frequency plasma with electron density n{sub e}>10{sup 10} cm{sup -3} was produced using MgO electrodes with a high secondary-electron-emission coefficient. It was found that in the case of MgO electrodes, both plasma density and optical emission intensity were about one order of magnitude higher than those in the case of Al electrodes.
- OSTI ID:
- 20634448
- Journal Information:
- Applied Physics Letters, Vol. 85, Issue 21; Other Information: DOI: 10.1063/1.1827353; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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