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Title: Hetero-epitaxy of perovskite oxides on GaAs(001) by molecular beam epitaxy

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.1783016· OSTI ID:20632729
; ; ; ; ;  [1]
  1. Microelectronics and Physical Sciences Laboratory, Process and Materials Characterization Laboratory, and Microelectronics and Physical Sciences Laboratory, Motorola Inc., 2100 East Elliot Road, Tempe, Arizona 85284 (United States)

Hetero-epitaxy of single-crystal perovskite SrTiO{sub 3} on GaAs(001) was achieved using molecular beam epitaxy. The growth was accomplished by deposition of a submonolayer of titanium on GaAs(001), followed by the co-deposition of strontium and titanium initiated at a low-temperature, low-oxygen-pressure condition. X-ray photoelectron spectroscopy showed that the Ti prelayer reacted with As and formed TiAs-like species on the As terminated GaAs(001) surface. Reflection-high-energy-electron diffraction showed that SrTiO{sub 3} grew coherently on the GaAs(001) at early stage of growth. This coherent behavior began to degrade when SrTiO{sub 3} thickness exceeded 20 A ring . Cross-sectional transmission electron microscopy revealed an abrupt interface between SrTiO{sub 3} and GaAs and good crystallinity of the SrTiO{sub 3} film. An epitaxial relationship between SrTiO{sub 3} and GaAs was further confirmed by x-ray diffraction. The success of growth of SrTiO{sub 3} on GaAs paves the way for integration of various functional perovskite oxides with GaAs.

OSTI ID:
20632729
Journal Information:
Applied Physics Letters, Vol. 85, Issue 7; Other Information: DOI: 10.1063/1.1783016; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English