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Title: In-situ RBS Studies on Dissolution of Pb Atoms from the SiO2 Surface into Water Solutions

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.1619745· OSTI ID:20632607
; ; ; ; ;  [1];  [2]; ; ;  [3]; ;  [4]
  1. Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-01 (Japan)
  2. National Institute of Advanced Industrial Science and Technology (AIST Chubu), 2266-98 Anagahora, Shimo-Shidami, Moriyama-ku, Nagoya 463-8560 (Japan)
  3. Tokai Establishment, JAERI, Watanuki-cho, Takasaki 370-12 (Japan)
  4. Takasaki Establishment, JAERI, Watanuki-cho, Takasaki 370-12 (Japan)

An in-situ RBS system has been developed to study the dissolution of Pb layers deposited physically on the SiO2 surface of Si(100) crystal into water solutions with different pH values. It is found that Pb atoms are not dissolved into alkaline water, but into acid water, and that the dissolution in the latter case is the zero-th order reaction kinetics and the rate constant is 0.67x1013 atoms cm-2s-1, which corresponds to 1.04x10-11 mol. cm-2s-1. The dissolution mechanism is discussed based on the experimental results.

OSTI ID:
20632607
Journal Information:
AIP Conference Proceedings, Vol. 680, Issue 1; Conference: 17. international conference on the application of accelerators in research and industry, Denton, TX (United States), 12-16 Nov 2002; Other Information: DOI: 10.1063/1.1619745; (c) 2003 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English